KLA-Tencor Corporation (NASDAQ:KLAC) Analyst Rating Consensus

KLA-Tencor Corporation (NASDAQ:KLAC) has received a short term rating of strong buy from experts at Zacks with a rank of 1. The stock has been rated an average of 2.43 by 7 Brokerage Firm. 2 Wall Street Firms have rated the stock as a strong buys. 5 Brokerage Firms have advised hold.

KLA-Tencor Corporation (NASDAQ:KLAC) should head towards $67.6 per share according to 5 Analysts in consensus. However, if the road gets shaky, the stock may fall short to $59 per share. The higher price estimate target is at $72 according to the Analysts.

KLA-Tencor Corporation (NASDAQ:KLAC) rose 0.29% or 0.21 points on Tuesday and made its way into the gainers of the day. After trading began at $73.75 the stock was seen hitting $74.05 as a peak level and $73.66 as the lowest level. The stock ended up at $73.86. The daily volume was measured at 1,232,829 shares. The 52-week high of the share price is $74.05 and the 52-week low is $44.95. The company has a market cap of $11,501 million.

Shares of KLA-Tencor Corporation rose by 1.69% in the last five trading days and 6.14% for the last 4 weeks. KLA-Tencor Corporation is up 4.16% in the last 3-month period. Year-to-Date the stock performance stands at 8.18%.

KLA-Tencor Corporation is a supplier of process control and yield management solutions for the semiconductor and related nanoelectronics industries. The Companys products are also used in various other industries, including the light emitting diode (LED) and data storage industries, as well as general materials research. KLA-Tencors products and services are used by bare wafer, integrated circuit (IC), lithography reticle and disk manufacturers around the world. These customers turn to the Company for inline wafer and IC defect monitoring, review and classification; reticle defect inspection and metrology; packaging and interconnect inspection; critical dimension (CD) metrology; pattern overlay metrology; film thickness, surface topography and composition measurements; measurement of in-chamber process conditions, wafer shape and stress metrology; computational lithography tools, and overall yield and fab-wide data management and analysis systems.

Comments (0)

Leave a Reply

Your email address will not be published. Required fields are marked *