Analyst Rating Update on Lam Research Corporation (LRCX)

Lam Research Corporation (NASDAQ:LRCX) : 10 brokerage houses believe that Lam Research Corporation (NASDAQ:LRCX) is a Strong Buy at current levels. Zacks Investment Research suggests a Sell with a rank of 4.The median of all the 10 Wall Street Analysts endorse the stock as a Strong Buy with a rating of 1.

Lam Research Corporation (NASDAQ:LRCX) has been rated by 10 research analysts. Fundamentally, the highest shorterm price forecast for the stock is expected to reach $100 and the lowest price target forecast is $85. The average forecast of all the analysts is $93.9 and the expected standard deviation is $4.33.

For the current week, the company shares have a recommendation consensus of Buy.

Lam Research Corporation (NASDAQ:LRCX): stock turned positive on Tuesday. Though the stock opened at $81, the bulls momentum made the stock top out at $81.69 level for the day. The stock recorded a low of $80.51 and closed the trading day at $81.67, in the green by 2.14%. The total traded volume for the day was 2,390,714. The stock had closed at $79.96 in the previous days trading.

In an insider trading activity,The officer (President and CEO) of Lam Research Corp, Anstice Martin B sold 7,948 shares at $73.9 on October 26, 2015. The Insider selling transaction had a total value worth of $587,357. The Insider information was disclosed with the Securities and Exchange Commission in a Form 4 filing.

Lam Research Corporation (Lam Research) is a supplier of wafer fabrication equipment and services to the semiconductor industry. The Companys products are used primarily in front-end wafer processing, which involves the steps that create the active components of a device and their wiring. It also addresses processes for back-end wafer-level packaging (WLP). In addition, its products are offered for related markets that rely on semiconductor processes and require production-proven manufacturing capability, such as micro-electromechanical systems (MEMS). Its thin film deposition systems form a devices sub-microscopic layers of conducting (metal) or insulating (dielectric) materials. It is a provider of plasma etch, a process step that selectively removes materials from the wafer to create the features and patterns of a device. Its wet spin clean and plasma-based bevel clean products remove particles, residues and film from the wafer surface before or after adjacent processes.

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